
Standard linear stages
Piezo Stage

Standard linear stages

Standard linear stages constitute a basic series among the piezo stage lineup, which ranges from single-axis types to integrated three-axes types with various strokes.
Classification of performances with two mechanisms
The mechanisms are classified into a "direct-drive mechanism," which has a high resonant frequency and is focused on high-speed response, and a "displacement magnification mechanism," which secures a stroke.
Direct-drive mechanism
- A mechanism in which a piezo-electric elements directly moves the table.
- It excels in resolution and response thanks to a short stroke.
- With high rigidity, it is capable of performing stable positioning even under a large load.
Displacement magnification mechanism
- The product has a mechanism for mechanically amplifying the elongation of the piezo-electric element.
- A stroke several times to more than ten times longer than the direct-drive type can be obtained according to the magnification ratio.
- Feedback control with the built-in displacement sensor also enables the positioning reproducibility to be maintained.
Applications
- Semiconductor and FPD inspection
- HDD Tester
- Laser optic alignment
- Interferometer devices
- Analytical Instruments
- Nanometer positioning
Lineup
PS1H / PS1L
Standard linear X-axis stage
PS1H Direct-drive mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PS1H25-006U | 6 | 1 | ±1 | 13000 | 5 | 25×30×16 |
PS1H35-006U | 6 | 1 | ±1 | 9700 | 10 | 35×35×16 |
PS1H45-012U | 12 | 1 | ±1 | 6200 | 10 | 45×45×16 |
PS1H60F-012U | 12 | 1 | ±1 | 4100 | 50 | 60×60×20 |
PS1H40F-020U | 20 | 1 | ±1 | 4100 | 30 | 48×60×13.5 |
PS1H60-020U | 20 | 1 | ±1 | 3300 | 10 | 60×60×16 |
PS1H80-030U | 30 | 1 | ±1 | 1900 | 10 | 80×80×16 |
PS1H80F-030U | 30 | 1 | ±1 | 1900 | 50 | 80×80×20 |
PS1L Displacement magnification mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PS1L45-030U | 30 | 1 | ±1 | 1500 | 10 | 45×50×20 |
PS1L40-050U | 50 | 2 | ±2 | 970 | 5 | 40×45×15 |
PS1L60-060U | 60 | 2 | ±2 | 1300 | 10 | 60×70×20 |
PS1L40-100U | 100 | 2 | ±2 | 510 | 5 | 40×45×15 |
PS1L65-250U | 250 | 10 | ±10 | 360 | 5 | 65×65×15 |
PS1L66-500U | 500 | 20 | ±20 | 200 | 5 | 66×66×17 |
PS1L80-700U | 700 | 30 | ±30 | 106 | 5 | 80×80×20 |
PS2H / PS2L
Standard linear XY-axes stage
PS2H Direct-drive mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PS2H60-012U | (X,Y)12 | (X,Y)1 | (X,Y)±1 | 2000 | 10 | 60×80×25 |
PS2H95-012U | (X,Y)12 | (X,Y)1 | (X,Y)±1 | 3800 | 10 |
95×95×25 |
PS2H60-030U | (X,Y)30 | (X,Y)1 | (X,Y)±1 | 1600 | 10 |
60×80×25 |
PS2H110-030U | (X,Y)30 | (X,Y)1 | (X,Y)±1 | 3400 | 10 |
110×110×25 |
PS2L Displacement magnification mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PS2L50-050U | (X,Y)50 | (X,Y)2 |
(X,Y)±2 | 420 | 5 | 50×50×25 |
PS2L92-050U | (X,Y)50 | (X,Y)2 |
(X,Y)±2 | 1300 | 10 | 92×92×25 |
PS2L100-080U | (X,Y)80 | (X,Y)2 |
(X,Y)±2 | 480 | 10 | 100×100×30 |
PS2L50-100U | (X,Y)100 | (X,Y)2 |
(X,Y)±2 | 280 | 5 | 50×50×25 |
PS2L60-250U | (X,Y)250 | (X,Y)10 |
(X,Y)±10 | 120 | 5 | 60×60×26 |
PSVH / PSVL
Standard linear Z-axis stage
PSVH Direct-drive mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PSVH35-006U | 6 | 1 | ±1 | 3500 | 10 | 35×35×26 |
PSVH45-012U | 12 | 1 | ±1 | 2600 | 10 | 45×45×36 |
PSVH60F-012U | 12 | 1 | ±1 | 1600 | 50 | 60×60×40 |
PSVH80F-030U | 30 | 1 | ±1 | 1200 | 50 | 80×80×60 |
PSVL Displacement magnification mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PSVL45-060U | 60 | 2 | ±2 | 570 | 5 | 45×45×32 |
PSVL45F-100U | 100 | 2 | ±2 | 300 | 10 | 45×45×32 |
PSVL60-100U | 100 | 2 | ±2 | 380 | 5 | 60×60×32 |
PSVL60F-100U | 100 | 2 | ±2 | 270 | 10 | 60×60×38 |
PSVL60F-150U | 150 | 5 | ±5 | 190 | 10 | 60×60×32 |
PSVL80F-300U | 300 | 10 | ±10 | 180 | 10 | 80×80×38 |
PS3H / PS3L
Standard linear XYZ-axes stage
PS3H Direct-drive mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PS3H70-020UA | (X,Y)20,(Z)12 | (X,Y,Z)1 | (X,Y,Z)±1 | 970 | 10 | 80×70×65 |
PS3H120-030U | (X,Y,Z)30 |
(X,Y,Z)1 | (X,Y,Z)±1 | 740 | 10 | 120×120×30 |
PS3L Displacement magnification mechanism
Model Number | Travel range [μm] |
Resolution [nm] |
Repeatability [nm] |
Resonant frequency [Hz] |
Load capacity [N] |
Size [mm] |
---|---|---|---|---|---|---|
PS3L100-080UA | (X,Y)80,(Z)20 | (X,Y)2,(Z)1 |
(X,Y)±2,(Z)±1 | 400 | 10 | 100×100×30 |
PS3L68-100U | (X,Y,Z)100 | (X,Y,Z)2 | (X,Y,Z)±2 | 250 | 5 | 68×68×40 |
Product Inquiry
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Piezo Stage
- Standard linear stages
- Stages with an opening
- Rotary/tilting stages
- For optical mirror alignment
- For objective lens focusing
- A stage for ultraprecision processing machinery
- A general-purpose type with a strain gauge
- Simple actuator
- Impact actuator
- Moisture-resistant / for special environments
- Controllers
- Piezo drivers
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Precision Motor Stage
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Force Sensor
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Examples of product application
- Laser/optics-related equipment,optical djustment
- Precision scanning / mapping measurement
- Uses for objective lens focusing
- Ultraprecision nano-machining / high-speed cutting
- Uses where various forms of precision positioning are required
- Micro force detection / measurement at μN (mg) level
- High-sensitivity force measurement while maintaining high rigidity
From inspection and measurement to manufacturing equipment
We are ready to respond to requests for precision positioning of nanometers to submicrons required for various applications.
Inquiry