Japanese piezoelectric equipment manufacturer
Piezo Stage

Rotary/tilting stages

Piezo Stage

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Rotary/tilting stages

The rotation and angle can be adjusted with a piezo drive. Each stage excels in high-speed oscillation and angular resolution despite a slight angular displacement, and is suitable for applications such as minute-angle alignment for an optical device and precision face matching.

A rotary guide with an elastic hinge mechanism

An originally designed elastic hinge mechanism magnifies slight expansion and contraction in displacement of the piezo element, and supports stable rotary motion.
With no friction or abrasion, the product excels in smooth and high-speed motion, and is suitable for the adjustment of minute angles.

  • Laser optical axis adjustment
  • Precision parallel mating
  • Small angle adjustment
  • Tilt adjustment
  • Cavity length adjustment
PT1C
Rotary type

PT1C

Model Number Deflection angle Resolution Resonant frequency
[Hz]
Load capacity
[N]
Size
[mm]
PT1C80-050S 50"[Sec]≒0.014°≒0.2mrad 0.05"[Sec]≒0.24μrad 5550 10 80×90×20
PT1C60-800S 800"[Sec]≒0.22°≒3.9mrad 0.05"[Sec]≒0.24μrad 640 10 60×60×20
PT1C60-1800S 1800"[Sec]≒0.50°≒ 8.7mrad 0.2"[Sec]≒1.0μrad 240 10 60×70×30
PT1G
Goniometry

PT1G

Model Number Deflection angle Resolution Resonant frequency
[Hz]
Load capacity
[N]
Size
[mm]
PT1G100-300S 300"[Sec]≒0.08°≒1.5mrad 0.02"[Sec]≒0.10μrad 260 20 100×100×30
PT1G100-500S 500"[Sec]≒0.14°≒2.4mrad 0.02"[Sec]≒0.10μrad 260 20 100×100×30
PT1T / PT3V
Tilting(+ rise/fall) type

PT1T / PT3V

Model Number Deflection angle,Travel range Resolution Resonant frequency
[Hz]
Load capacity
[N]
Size
[mm]
Inclination Lifting Inclination Lifting
PT1T60-500S 500"[Sec] ≒0.14°≒2.4mrad - 0.02"[Sec]≒0.10μrad - 1800 10 60×60×30
PT3V80F-400S ±400"[Sec]≒±0.11°≒±1.9mrad 100μm 0.02"[Sec]≒0.10μrad 2nm 270 10 80×80×32
PT3V100-800S ±800"[Sec]≒±0.22°≒±3.9mrad 300μm 0.04"[Sec]≒0.19μrad 10nm 230 10 100×100×32

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From inspection and measurement to manufacturing equipment

We are ready to respond to requests for precision positioning of nanometers to submicrons required for various applications.

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